Abstract:
With the advent of smart power technology and the concept of system-on-chip (SoC) for variety of applications, ranging from power management circuit and driver circuit of RF power amplifiers, integration of high voltage (HV) devices along with digital logic core has become the need of the day. Since digital logic core is implemented with continuously scaled CMOS transistors, it is a challenge to design HV devices compatible with each technology node. To server such as wise range to applications, these devices should have complementary counterparts, high breakdown voltage, low on-resistance, good DC and RF characteristics and good hot-carrier reliability. All these challenges need to be accomplished within the restriction of having none or few extra process steps, to limit the additional cost.
In this work, we present optimized process-flow for complementary LDMOS transistors, which is compatible with SCL’s 0.18 um COMS process-flow. Simulation based results for N-LDMOS and P-LDMOS transistors report breakdown voltage greater than 20 v for both and ft /fMAX of 18 GHz/64 GHz and 13 GHz/49 GHZ respectively. These devices, with minimum degradation of other performance parameters, can provide breakdown voltage scalability with drift-length. Designed LDMOS transistors also provide good DC characteristics and can be easily fabricated with just two additional masks and few process steps on the top of baseline process. The designed process-flow has minimal impact of mask-misalignment, and undesirable and inseparable part of deep-submicron technologies processes. The competitive simulation results show that, these devices when fabricated would provide a cost-effective solution for applications with operating voltage upto 20 V.