Interrupted growth to manipulate phase-separation in DIP:C60 organic semiconductor blends

Show simple item record Banerjee, Rupak Hinderhofer, Alexander Weinmann, Michael Reisz, Berthold Lorch, Christopher Gerlach, Alexander Oettel, Martin Schreiber, Frank 2018-01-08T12:33:48Z 2018-01-08T12:33:48Z 2017-12
dc.identifier.citation Banerjee, Rupak; Hinderhofer, Alexander; Weinmann, Michael; Reisz, Berthold; Lorch, Christopher; Gerlach, Alexander; Oettel, Martin and Schreiber, Frank, "Interrupted growth to manipulate phase-separation in DIP:C60 organic semiconductor blends", The Journal of Physical Chemistry C, DOI: 10.1021/acs.jpcc.7b09637, Dec. 2017. en_US
dc.identifier.issn 1932-7447
dc.identifier.issn 1932-7455
dc.description.statementofresponsibility by Rupak Banerjee, Alexander Hinderhofer, Michael Weinmann, Berthold Reisz, Christopher Lorch, Alexander Gerlach, Martin Oettel and Frank Schreiber
dc.format.extent vol.122, no.3, pp.1839-1845
dc.language.iso en en_US
dc.publisher American Chemical Society en_US
dc.subject We studied the influence of periodic growth interruptions during co-deposition of diindeno-perylene (DIP) and buckminsterfullerene (C60) in an equimolar mixing ratio. DIP and C60 are known to phase-separate when co-deposited, but the details and in particular the length scales depend on kinetic factors. Using X-ray scattering and atomic force microscopy, we demonstrate that the phase separation mechanism is in fact influenced by growth interruptions, with more pronounced effects if the deposition rates are low. For high deposition rates, growth interruptions have no appreciable effect. We discuss our proof of the concept investigation in the context of the relevant processes and their time scales. en_US
dc.title Interrupted growth to manipulate phase-separation in DIP:C60 organic semiconductor blends en_US
dc.type Article en_US
dc.relation.journal The Journal of Physical Chemistry C

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