Fabrication of long-ranged close-packed monolayer of silica nanospheres by spin coating

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dc.contributor.author Khanna, Sakshum
dc.contributor.author Utsav
dc.contributor.author Marathey, Priyanka
dc.contributor.author Chaliyawala, Harsh
dc.contributor.author Rajaram, Narasimman
dc.contributor.author Roy, Debmalya
dc.contributor.author Banerjee, Rupak
dc.contributor.author Mukhopadhyay, Indrajit
dc.date.accessioned 2018-06-06T07:19:48Z
dc.date.available 2018-06-06T07:19:48Z
dc.date.issued 2018-05
dc.identifier.citation Khanna, Sakshum; Utsav, Marathey, Priyanka; Chaliyawala, Harsh; Rajaram, Narasimman; Roy, Debmalya; Banerjee, Rupak and Mukhopadhyay, Indrajit, "Fabrication of long-ranged close-packed monolayer of silica nanospheres by spin coating", Colloids and Surfaces A: Physicochemical and Engineering Aspects, DOI: 10.1016/j.colsurfa.2018.05.063, May 2018. en_US
dc.identifier.issn 0927-7757
dc.identifier.uri http://dx.doi.org/10.1016/j.colsurfa.2018.05.063
dc.identifier.uri https://repository.iitgn.ac.in/handle/123456789/3689
dc.description.abstract In light of the importance of nanostructured surfaces for various technological applications, it becomes imperative to look for simple and reliable methods for assembling ordered nanostructures over a large area. Several methods have been employed for fabricating nanostructured surfaces but not many are compatible with large-scale fabrication. Here we demonstrate the fabrication of long-range ordered close-packed monolayer of silica nanospheres (SNs) (size approximately 200 nm) deposited on a silicon substrate by a three-step spin coating technique in atmospheric conditions, which could be realized on a very small time scale but has significant potential in numerous applications. The dispersity of the SNs and the influence of various deposition parameters like surface modification, SNs concentration, spin speed, spinning time and the volume of aliquot spread over the silicon substrate were studied to optimize uniform high surface coverage of the film. A relatively uniform monolayer film and high surface coverage of silica particles ranging from 85 to 90% were achieved by optimizing the above deposition parameters. These nanostructures templates can be used in the formation non-close-packed monolayer facilitating further development of ordered nanowires, which highlights the prospect of this approach as a simple preparation method for ordered arrays of nanospheres. We conclude that this method is highly suitable for industrial applications, because of faster and effective rate of production and scalability.
dc.description.statementofresponsibility by Sakshum Khannaa, Utsavb, Priyanka Maratheya, Harsh Chaliyawalaa, Narasimman Rajarama, Debmalya Royc, Rupak Banerjeeb and Indrajit Mukhopadhyay
dc.language.iso en en_US
dc.publisher Elsevier en_US
dc.subject Silica Nanospheres en_US
dc.subject Spin Coating en_US
dc.subject Electron Microscope en_US
dc.subject Surface coverage en_US
dc.title Fabrication of long-ranged close-packed monolayer of silica nanospheres by spin coating en_US
dc.type Article en_US
dc.relation.journal Colloids and Surfaces A: Physicochemical and Engineering Aspects


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