Kumar, Pardeep; Rosenbluth, Alan E.; Pusuluri, Ramana Murthy; Viswanathan, Ramya; Srinivasan, Babji; Mohapatra, Nihar Ranjan
(Society of Photo-optical Instrumentation Engineers, 2018-04)
A two-stage approach is introduced to improve the accuracy of compact patterning models used in large-scale computational lithography. Each of the two stages uses a separate empirically calibrated regression model whose ...