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  • Kumar, Pardeep; Rosenbluth, Alan E.; Pusuluri, Ramana Murthy; Viswanathan, Ramya; Srinivasan, Babji; Mohapatra, Nihar Ranjan (Society of Photo-optical Instrumentation Engineers, 2018-04)
    A two-stage approach is introduced to improve the accuracy of compact patterning models used in large-scale computational lithography. Each of the two stages uses a separate empirically calibrated regression model whose ...

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