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  • Dawar, Rohit; Samit Barai; Kumar, Pardeep; Srinivasan, Babji; Mohapatra, Nihar Ranjan (Society of Photo-optical Instrumentation Engineers (SPIE), 2019-04)
    With continuous downscaling of feature sizes, potentially problematic patterns (hotspots) have become a major issue in generation of optimized mask design for better printability. The lithography process sensitive patterns ...

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