Role of Interface(s) for the Growth of Ultra-Thin Amorphous Oxides on Al–Si Alloys: A Thermodynamic Analysis

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dc.contributor.author Panda, Emila
dc.contributor.author Manwani, Krishna
dc.date.accessioned 2014-03-18T18:29:06Z
dc.date.available 2014-03-18T18:29:06Z
dc.date.issued 2014-02
dc.identifier.citation Panda, Emila and Manwani, Krishna, "Role of interface(s) for the growth of ultra-thin amorphous oxides on al–si alloys: a thermodynamic Analysis", Journal of the American Ceramic Society, DOI: 10.1111/jace.12789, vol. 97, no. 2, pp. 465-472, Feb. 2014. en_US
dc.identifier.issn 0002-7820
dc.identifier.uri http://dx.doi.org/10.1111/jace.12789
dc.identifier.uri https://repository.iitgn.ac.in/handle/123456789/921
dc.description.abstract This study presents a thermodynamic analysis to predict the type of initial, amorphous oxide overgrowth (i.e., am-Al2O3 or am-SiO2) on bare Al–Si alloy substrates. This analysis have taken into account the energies associated with both its interfaces (interface between the Al–Si alloy substrate and the thin oxide film and interface between the thin oxide film and vacuum) along with the bulk Gibbs free energy of oxide formation. This developed analysis is then applied for various parameters, such as, Si alloying element content at the substrate/oxide interface, the growth temperature, the oxide film thickness (up to 1 nm), and various low-index crystallographic surfaces of the substrate. It is found that am-SiO2 overgrowth is thermodynamically preferred for a combination of lower oxide film thickness, lower growth temperature, and lower Si alloying content at the alloy/oxide interface. This is because of the overcompensation of the lower energies of both the interfaces over the bulk Gibbs free energy. Furthermore, it is found that for all cases, am-Al2O3 forms a more stable interface with Al–Si alloy than am-SiO2. en_US
dc.description.statementofresponsibility by Emila Panda and Krishna Manwani
dc.format.extent Vol. 97, No. 2, pp. 465-472
dc.language.iso en en_US
dc.publisher Wiley en_US
dc.subject Al Si alloy en_US
dc.subject Amorphous oxide en_US
dc.subject Ultra thin en_US
dc.subject Thermodynamic Analysis en_US
dc.title Role of Interface(s) for the Growth of Ultra-Thin Amorphous Oxides on Al–Si Alloys: A Thermodynamic Analysis en_US
dc.type Article en_US
dc.relation.journal Journal of the American Ceramic Society


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