Process-induced uniaxial strain in Nanosheet-FET based CMOS technology-is it still beneficial?

Kaur, RamandeepRamandeepKaurMohapatra, Nihar RanjanNihar RanjanMohapatra2025-09-042025-09-042023-03-07http://repository.iitgn.ac.in/handle/IITG2025/30835en-USProcess-induced uniaxial strain in Nanosheet-FET based CMOS technology-is it still beneficial?Conference Paper123456789/493