Nonlinear PCA for source optimization in optical lithography

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dc.contributor.author Kumar, Pardeep
dc.contributor.author Srinivasan, Babji
dc.contributor.author Mohapatra, Nihar Ranjan
dc.contributor.other 18th International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2013 IEEE
dc.coverage.spatial Glasgow, SCN, UK
dc.date.accessioned 2014-04-25T06:19:36Z
dc.date.available 2014-04-25T06:19:36Z
dc.date.issued 2013-09-03
dc.identifier.citation Kumar, Pardeep; Srinivasan, Babji and Mohapatra, Nihar Ranjan, “Nonlinear PCA for source optimization in optical lithography”, in 18th International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2013 IEEE, Glasgow, SCN, UK,URL: http://www.sispad2013.org/, pp. 216-219, Sep. 3-5, 2013, ISBN: 9781467357364. en_US
dc.identifier.isbn 9781467357364.
dc.identifier.uri https://repository.iitgn.ac.in/handle/123456789/1182
dc.description.abstract - In this paper, we propose a Kernel PCA (KPCA) based light source optimization method for computation of the aerial image. The proposed approach is more general in nature and considers both continuous as well as discontinuous intensity distribution from different types of lithography light sources. We have compared both the PCA and KPCA approach, on four different light sources (conventional, annular, dipole, and quadruple light sources) used in optical lithography. Our simulation results clearly indicate that the KPCA performance in variance coverage among discrete data sets is better than the PCA for all the four types of light sources. Thus using KPCA, we can reduce the number of kernels (pixels) for different shapes of light sources using lesser number of principal components (PCs) compared to the PCA based linear approaches. This will help in reducing the computational complexity during the simulation of aerial image formation. en_US
dc.description.statementofresponsibility by Pradeep Kumar, Babji Srinivasan and Nihar Ranjan Mohapatra
dc.format.extent pp. 216-219
dc.language.iso en en_US
dc.subject Kernel PCA en_US
dc.subject Lithography simulation en_US
dc.subject Resolution enhancement techniques en_US
dc.subject Source optimization en_US
dc.title Nonlinear PCA for source optimization in optical lithography en_US
dc.type Article en_US


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