Understanding the surface Chemistry, surface roughness and wettability of argon plasma treated cornstarch powder

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dc.contributor.author Dixit, Deepa
dc.contributor.author Bunk, Shreya
dc.contributor.author Rane, Ramkrishna
dc.contributor.author Ghoroi, Chinmay
dc.contributor.other 2017 AIChE Annual Meeting
dc.coverage.spatial Minneapolis Convention Center, Minneapolis, US
dc.date.accessioned 2017-12-06T05:29:07Z
dc.date.available 2017-12-06T05:29:07Z
dc.date.issued 2017-10-29
dc.identifier.citation Dixit, Deepa; Bunk, Shreya; Rane, Ramkrishna and Ghoroi, Chinmay, "Understanding the surface Chemistry, surface roughness and wettability of argon plasma treated cornstarch powder", in the 2017 AIChE Annual Meeting, Minneapolis Convention Center, Minneapolis, US, Oct. 29-Nov. 3, 2017. en_US
dc.identifier.uri https://repository.iitgn.ac.in/handle/123456789/3323
dc.description.statementofresponsibility by Deepa Dixit, Shreya Bunk, Ramkrishna Rane and Chinmay Ghoroi
dc.language.iso en en_US
dc.publisher American Institute of Chemical Engineers en_US
dc.title Understanding the surface Chemistry, surface roughness and wettability of argon plasma treated cornstarch powder en_US
dc.type Article en_US


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