Influence of Ar plasma treatment on the wetting behavior of pharmaceutical powders

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dc.contributor.author Dixit, Deepa
dc.contributor.author Bunk, Shreya
dc.contributor.author Rane, Ramkrishna
dc.contributor.author Ghoroi, Chinmay
dc.date.accessioned 2018-10-04T12:52:44Z
dc.date.available 2018-10-04T12:52:44Z
dc.date.issued 2018-09
dc.identifier.citation Dixit, Deepa; Bunk, Shreya; Rane, Ramkrishna and Ghoroi, Chinmay, "Influence of Ar plasma treatment on the wetting behavior of pharmaceutical powders", Advanced Powder Technology, DOI: 10.1016/j.apt.2018.09.015, Sep. 2018. en_US
dc.identifier.issn 0921-8831
dc.identifier.uri https://doi.org/10.1016/j.apt.2018.09.015
dc.identifier.uri https://repository.iitgn.ac.in/handle/123456789/3928
dc.description.abstract In this study, corn starch and ibuprofen are treated in Argon (Ar) plasma to enhance the wettability of the powders without using any additive or guest particle. The powder and pellets were exposed to the Ar plasma for different time intervals (5-20 min) at optimized pressure and voltage. While the morphological changes due to plasma exposure are captured by SEM, the AFM measurement shows the variations insurface roughness for both corn starch and ibuprofen powders. The XPS and surface energy results confirm that the surface groups change is dominating under initial exposure, but longer exposure creates more damaging effect than building the new active sites at the surface. The contact angle (CA) measurementshows that with increase in treatment time, the CA decrease from 48 to 33 for corn starch and 69 to 51 for ibuprofen. A comparison of experimentally obtained CA and that of theoretically calculated CA shows that there exists some difference. This may be attributed to the absence of surface group contribution in the Wenzel model. The present study shows that short exposure is sufficient enough to improve the wetting where the surface group plays a dominant role over surface roughness.
dc.description.statementofresponsibility by Deepa Dixit, Shreya Bunk, Ramkrishna Rane and Chinmay Ghoroi
dc.language.iso en en_US
dc.publisher Elsevier en_US
dc.subject Plasma treatment en_US
dc.subject Surface roughness en_US
dc.subject Wettability en_US
dc.title Influence of Ar plasma treatment on the wetting behavior of pharmaceutical powders en_US
dc.type Article en_US
dc.relation.journal Advanced Powder Technology


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