Controlled etching of silica nanospheres monolayer for template application: a systematic study

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dc.contributor.author Utsav
dc.contributor.author Khanna, Sakshum
dc.contributor.author Paneliya, Sagar
dc.contributor.author Ray, Abhijit
dc.contributor.author Mukhopadhyay, Indrajit
dc.contributor.author Banerjee, Rupak
dc.date.accessioned 2019-10-11T07:27:00Z
dc.date.available 2019-10-11T07:27:00Z
dc.date.issued 2019-10
dc.identifier.citation Utsav; Khanna, Sakshum; Paneliya, Sagar; Ray, Abhijit; Mukhopadhyay, Indrajit and Banerjee, Rupak, "Controlled etching of silica nanospheres monolayer for template application: a systematic study", Applied Surface Science, DOI: 10.1016/j.apsusc.2019.144050, Oct. 2019. en_US
dc.identifier.issn 0169-4332
dc.identifier.uri http://dx.doi.org/10.1016/j.apsusc.2019.144050
dc.identifier.uri https://repository.iitgn.ac.in/handle/123456789/4879
dc.description.abstract Monolayers of silica nanospheres (SNs), via self- or guided-assembly has been extensively used for template fabrication in thin films, employed in the areas of plasmonics, photonic crystals, and solar cells. We report on a versatile, rapid, and controllable process to obtain non-close-packed structure by restructuring the SNs geometry at two-particle level. A geometrical model has been proposed to quantify parameters that control the final morphology of the monolayer. SNs of different sizes (viz. 140 nm, 170 nm, and 220 nm) were self-assembled as a close-packed monolayer on a silicon substrate using a three-step spin coating method and then sintered at 950�C before being exposed to an etchant. We investigate the dependence of particle radius, neck (formed due to sintering) parameters and distance between the SNs, on etching time and etchant concentration. The intermediate and final morphology of the restructured monolayer is used as a template to grow silicon nanowires using metal-assisted chemical etching. We provide quantitative estimates of the parameters pertaining to the restructuring of the monolayer of SNs, which can be used as tunable templates for the growth of nanowires. The optimized process can be scaled-up for industrial application because of its faster and controllable rate of production.
dc.description.statementofresponsibility by Utsava Sakshum Khanna, Sagar Paneliya, Abhijit Ray, Indrajit Mukhopadhyay and Rupak Banerjeea
dc.language.iso en_US en_US
dc.publisher Elsevier en_US
dc.subject Silica Nanospheres en_US
dc.subject Self-Assembly en_US
dc.subject Etching en_US
dc.subject Sintering en_US
dc.subject Non-Close-Packed Monolayer en_US
dc.title Controlled etching of silica nanospheres monolayer for template application: a systematic study en_US
dc.type Article en_US
dc.relation.journal Applied Surface Science


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