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  • Nath, Biplob; Barai, Samit; Kumar, Pardeep; Srinivasan, Babji; Mohapatra, Nihar Ranjan (Institute of Electrical and Electronics Engineers, 2021-08)
    This work proposes a methodology to find lithography yield detractors using Design Rule Checks (DRC) that are derived from a supervised Machine Learning (ML) model. The probability of being an outlier in layout parameter ...

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