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  • Kumar, Pardeep; Srinivasan, Babji; Mohapatra, Nihar Ranjan (SPIE, 2015-05)
    As technology nodes continue to shrink, optical proximity correction (OPC) has become an integral part of mask design to improve the subwavelength printability. The success of lithography simulation to perform OPC on an ...
  • Kumar, Pardeep; Rosenbluth, Alan E.; Pusuluri, Ramana Murthy; Viswanathan, Ramya; Srinivasan, Babji; Mohapatra, Nihar Ranjan (Society of Photo-optical Instrumentation Engineers, 2018-04)
    A two-stage approach is introduced to improve the accuracy of compact patterning models used in large-scale computational lithography. Each of the two stages uses a separate empirically calibrated regression model whose ...
  • Kumar, Pardeep; Srinivasan, Babji; Mohapatra, Nihar Ranjan (Society of Photo-optical Instrumentation Engineers, 2018-09)
    Kumar, Pardeep; Srinivasan, Babji and Mohapatra, Nihar, "Sample plan selection techniques for Lithography process model building", Journal of Micro/Nanolithography, MEMS, and MOEMS, Sep. 2018.

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