Pinned adcolloids disfavor nucleation in colloidal vapor deposition

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dc.contributor.author Barbhuiya, Noman Hanif
dc.contributor.author Mohanty, Pritam K.
dc.contributor.author Mondal, Saikat
dc.contributor.author Hussain, Aminul
dc.contributor.author Agarwala, Adhip
dc.contributor.author Mishra, Chandan K.
dc.coverage.spatial United States of America
dc.date.accessioned 2025-06-12T06:23:41Z
dc.date.available 2025-06-12T06:23:41Z
dc.date.issued 2025-05
dc.identifier.citation Barbhuiya, Noman Hanif; Mohanty, Pritam K.; Mondal, Saikat; Hussain, Aminul; Agarwala, Adhip and Mishra, Chandan K., "Pinned adcolloids disfavor nucleation in colloidal vapor deposition", Physical Review E, DOI: 10.1103/PhysRevE.111.L053403, vol. 111, no. 5, May 2025
dc.identifier.issn 2470-0045
dc.identifier.issn 2470-0053
dc.identifier.uri https://doi.org/10.1103/PhysRevE.111.L053403
dc.identifier.uri https://repository.iitgn.ac.in/handle/123456789/11509
dc.description.abstract Crystallization through vapor deposition is ubiquitous and is inevitably influenced by impurities that often impact the local structure. Interestingly, the effect of immobilizing some of the depositing particles themselves, which would preserve local structural symmetry, remains largely unexplored. Herein, we perform colloidal vapor deposition on a substrate with a few pinned adcolloids, termed “mobility impurities.” Through thermodynamic and kinematic measurements, we demonstrate that these pinned adcolloids, even though they share identical geometry and interaction with depositing particles, are disfavored as nucleation centers. Our experimental findings, supported by molecular dynamics simulations and a simple theoretical model, reveal that entropic contributions, rather than energetic ones, govern nucleation physics in the presence of mobility impurities. Moreover, tuning the mobility of colloids on the substrate adjusts the nucleation likelihood at pinned sites. In later stages of growth, pinning induces mode localization and alters the thin film's vibrational spectrum. Our work thus underscores the potential of strategically incorporating mobility impurities to engineer material properties.
dc.description.statementofresponsibility by Noman Hanif Barbhuiya, Pritam K. Mohanty, Saikat Mondal, Aminul Hussain, Adhip Agarwala and Chandan K. Mishra
dc.format.extent vol. 111, no. 5
dc.language.iso en_US
dc.publisher American Physical Society
dc.title Pinned adcolloids disfavor nucleation in colloidal vapor deposition
dc.type Article
dc.relation.journal Physical Review E


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