Numerical study of thermophoretic deposition of nano-silica using outside vapor depositon

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dc.contributor.advisor Sarkar, Arnab
dc.contributor.advisor Ghoroi, Chinmay Shukla, Upendra Kumar 2015-04-21T13:24:24Z 2015-04-21T13:24:24Z 2013
dc.identifier.citation Shukla, Upendra Kumar (2013). Numerical study of thermophoretic deposition of nano-silica using outside vapor depositon (M. Tech. Dissertations). Indian Institute of Technology, Gandhinagar, pp. 68 (Acc No: T00047) en_US
dc.description.abstract There are many available processes for optical fiber manufacturing like modified chemical vapor deposition, vapor axial deposition, and outside vapor deposition. The most popular method for optical fiber manufacturing on commercial scale is Outside Vapor Deposition (OVD). Owing to its fundamental importance, several people have studied (both experimental observation and numerical study) the effect of process parameters on optical fiber manufacturing. But all the numerical works available on this topic has been done in the very small range of process parameter and most of which are related to two dimensional approximation of the process. Whereas the industrial range of process parameters are much larger and the actual process is three dimensional. The objective of the present work is to fill this gap of knowledge in the literature. The study has been carried out by using commercial software, ANSYS Fluent which is based on finite volume discretization of governing equation for flow problems. The simple scheme has been used for pressure velocity coupling. A second order upwind scheme is used to discretize the convective terms in momentum, energy, and species balance equation. The simulation was carried out both in three-dimensional (3-D) and two-dimensional (2-D) geometry. While 3-D simulation was performed using steady state, quasi-steady state and unsteady state model, 2-D simulation was per-formed only for steady state model. The effect of different parameters such as burner to target distance, target surface temperature, burner speed, and target diameter on efficiency of deposition has been studied in this work in the large range of parameter space. The present solution methodology is consistent with prior publications in the field, and has been validated with the previous published experimental results available in literature. It is shown that as the traversing burner speed and diameter of the target is increased the efficiency of deposition increases due to increase in thermophoretic force. As the surface temperature increases the deposition efficiency decreases due to decrease in thermophoretic force. As the burner to target distance increases, the deposition efficiency first increases and then remains constant for some interval before decreasing it rapidly on further increasing the distance between burner and target. en_US
dc.description.statementofresponsibility by Upendra Kumar Shukla
dc.format.extent xi, 68 p.; col.; ill; 24 cm. + 1 CD-ROM
dc.language.iso en en_US
dc.publisher Indian Institute of Technology, Gandhinagar en_US
dc.subject Outside vapor deposition en_US
dc.subject Optical fiber en_US
dc.subject Thermometric force en_US
dc.subject Deposition efficiency en_US
dc.title Numerical study of thermophoretic deposition of nano-silica using outside vapor depositon en_US
dc.type Thesis en_US
dc.contributor.department Chemical Engineering M.Tech.

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