dc.contributor.author |
Machhiwar, Yogendra |
|
dc.contributor.author |
Gill, Garima |
|
dc.contributor.author |
Kaushal, Kumari Neeraj |
|
dc.contributor.author |
Mohapatra, Nihar Ranjan |
|
dc.contributor.author |
Agarwal, Harshit |
|
dc.coverage.spatial |
United States of America |
|
dc.date.accessioned |
2023-11-09T11:12:59Z |
|
dc.date.available |
2023-11-09T11:12:59Z |
|
dc.date.issued |
2024-01 |
|
dc.identifier.citation |
Machhiwar, Yogendra; Gill, Garima; Kaushal, Kumari Neeraj; Mohapatra, Nihar Ranjan; Agarwal, Harshit, "Compact modeling of LDMOS transistors over a wide temperature range including cryogenics", IEEE Transactions on Electron Devices, DOI: 10.1109/TED.2023.3326107, vol. 71, no. 1, pp. 77-83, Jan. 2024. |
|
dc.identifier.issn |
0018-9383 |
|
dc.identifier.issn |
1557-9646 |
|
dc.identifier.uri |
https://doi.org/10.1109/TED.2023.3326107 |
|
dc.identifier.uri |
https://repository.iitgn.ac.in/handle/123456789/9427 |
|
dc.description.abstract |
An improved compact model of high-voltage laterally diffused MOS (LDMOS) transistors valid over a wide temperature range including cryogenic is presented. The existing BSIM-BULK HV compact model is improved to include carrier freeze-out and field-assisted ionization models, which are key for the HV devices. In addition, temperature dependence of mobility, flat-band voltage, and saturation velocity models are also improved for application to cryogenic temperatures. The proposed model is implemented within the framework of the BSIM-BULK HV compact model and shows excellent capability in modeling experimental LDMOS transistor data for temperatures between 300 and 77 K. |
|
dc.description.statementofresponsibility |
by Yogendra Machhiwar, Garima Gill, Kumari Neeraj Kaushal, Nihar Ranjan Mohapatra and Harshit Agarwal |
|
dc.format.extent |
vol. 71, no. 1, pp. 77-83 |
|
dc.language.iso |
en_US |
|
dc.publisher |
Institute of Electrical and Electronics Engineers |
|
dc.subject |
BSIM-BULK |
|
dc.subject |
Carrier freeze-out |
|
dc.subject |
Complementary metal-oxide-semiconductor (CMOS) |
|
dc.subject |
Cryogenic |
|
dc.subject |
Laterally diffused MOS (LDMOS) |
|
dc.subject |
Semiconductor device modeling |
|
dc.title |
Compact modeling of LDMOS transistors over a wide temperature range including cryogenics |
|
dc.type |
Article |
|
dc.relation.journal |
IEEE Transactions on Electron Devices |
|