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  4. Controlling the Clamping Voltage in Punch-Through Diodes via N+ Well and Contact Design for Low Voltage System Level ESD Protection
 
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Controlling the Clamping Voltage in Punch-Through Diodes via N+ Well and Contact Design for Low Voltage System Level ESD Protection

Source
9th IEEE Electron Devices Technology & Manufacturing Conference (EDTM 2025)
Date Issued
2025-01-01
Author(s)
Likhitkar, Praful
Maheshwari, Navin
Lashkare, Sandip  
DOI
10.1109/EDTM61175.2025.11040750
Abstract
A low voltage Electrostatic Discharge protection device is essential for low-voltage interfaces such as low-voltage MDIOs, Next-gen USB, and Thunderbolt interfaces. Here, a four-layer (n<sup>++</sup>p<sup>+</sup>p<sup>-</sup>n<sup>+</sup>) punch through diode is studied comprehensively, emphasizing lowering clamping voltage (Vclamp) by reducing dynamic resistance (RDYN). Further, two advanced designs with multi-contact & n+ well design are proposed to reduce the RDYN. The n+ well design lowers the RDYN by ~ 30%, lowering the Vclamp and enhancing IC protection.
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URI
https://repository.iitgn.ac.in/handle/IITG2025/28337
Subjects
Clamping Voltage | Dynamic Resistance
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