Processing-structure-property correlations in thin film deposition via molecular dynamics simulations

dc.contributor.advisor	Ranganathan, Raghavan
dc.contributor.author	Raj, Kishalay
dc.date.accessioned	2024-09-13T08:19:29Z
dc.date.available	2024-09-13T08:19:29Z
dc.date.issued	2024
dc.identifier.citation	Raj, Kishalay (2024). Processing-structure-property correlations in thin film deposition via molecular dynamics simulations. Gandhinagar: Indian Institute of Technology Gandhinagar, 156p. (Acc. No.: T01265).
dc.identifier.uri	https://repository.iitgn.ac.in/handle/123456789/10552
dc.description.statementofresponsibility	by Kishalay Raj
dc.format.extent	xxi, 156p.: hbk.; 30 cm
dc.language.iso	en_US
dc.publisher	Indian Institute of Technology Gandhinagar
dc.subject	Thin Film
dc.subject	Molecular Simulations
dc.subject	Interatomic Potentials
dc.subject	Au-Cr-SiO2
dc.subject	Deposition Energy
dc.subject	Annealing
dc.subject	Coefficient-Thermal Expansion
dc.subject	Tensile Properties
dc.subject	Viscoelastic Properties
dc.title	Processing-structure-property correlations in thin film deposition via molecular dynamics simulations
dc.type	Thesis
dc.contributor.department	Materials Engineering
dc.description.degree	M.Tech